Integrated Wafer Handling Systems

EFEM Systems

Integrated Wafer Handling Systems

EFEM Systems

Brochure

Hine Automation EFEM Systems

DLP-300 EFEM

An Equipment Front End Module (EFEM), a mainstay of semiconductor automation, transports product (silicon wafers or quartz photomasks) between ultra-clean storage carriers and a variety of processing, measurement, and testing systems. The EFEM contains the key components needed to unload product, deliver it to the parent tool for processing and return the product to its carrier upon completion.

The DLP-300 EFEM is designed to be used with an existing OEM GEM base system and can be configured to handle a variety of wafers sizes from a maximum of 2 load ports to 2 load locks. In addition, Angled Transfer Chambers or process modules connect directly to the rear of the DLP-300.

The DLP-300 hardware supports up to two load ports, an atmospheric robot with an end effector, a power system with safety circuits, a fan filter unit, a user interface, an aligner, a frame, and skins.

The base configuration accepts open cassette load ports for 150mm and 200mm wafers, SMIF load ports for 200mm wafers, and FOUPs for 300mm wafers. These load ports are designed to automatically detect the loaded transport wafer carrier size with its presence sensors or Infopad.

The system implements unit-level software that communicates with the components within the DLP-300 (robots, load ports, aligners, valves, fans, etc.) However, the OEM is responsible for integrating communication with their platform.

FEATURES

  • Designed to interface with an existing OEM GEM base system

  • Capable of supporting

    • Up to TWO Load Ports
    • Up to TWO Load Locks
    • An Atmospheric Robot with End Effector
    • An Aligner
    • Angled Transfer Chambers or Process Chambers
  • Load ports capable of accepting open cassette load ports for 150mm and 200mm wafers, SMIF load ports for 200mm wafers and FOUPs for 300mm wafers

  • Unit level software to communicate with the components within the EFEM (robots, load ports, aligner, valves, fans etc.)

OPTIONS

  • Stand-alone or Thru-Wall Configuration

  • Fan Filter Unit

  • Up to two SEMI compliant 150mm/200mm Open Cassette and SMIF load ports

  • Up to two SEMI compliant 300mm FOUP load ports

  • User interface adjustable for sitting and standing

  • Design Standard – HEPA Filter ISO Clean Room Class 3

  • Design Standard – ULPA Filter ISO Clean Room Class 1

PRODUCT SPECIFICATIONS

General


Dimensions


Operating/Storage Temps

Wafer Sizes

Width: 1377 mm (54.2")
Depth- Enclosure Only: 760.0mm (31.34")
Depth- Enclosure with CLP installed: 1241.1mm (48.9")
Height: 2034.5mm (80.1")

20˚C to 30˚C

100, 125, 150, 200, 300mm Standard SEMI M1

Throughput

Max Processing

MCBF

MTTR

Wafer Breakage Rate
(non-warped wafers only)

MTTR

> 60 wafers per hour (no process delay with vacuum end effector)

> 5 x 10^5 transfers

< 2 Hours

> 5x10^5

< 2 Hours

Environment

Upon Request

FFU ULPA Option

FFU ULPA Option

NO FFU Option

ISO Class 3 and Class 1 configuration options available.

ISO Class 1 per ISO-14644-1 during wafer transfer and under static condition

ULPA/PTFE Filter catches 99.99995% MPPS of particles 0.12 microns and above. PTFE Filter with integrated ionization & dual LED "Lumifilter" light bars is ISO Class 1 compatible.

Mini-environment cleanliness is dependent upon installation environment cleanliness.

Regulatory Compliance

SEMI S2

SEMI S2

Related Products

Designs and Manufactures Vacuum Atmospheric Automation Systems and Robotic Components

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